日本に半導体研究開発拠点　先端設備導入、インテル協力―産総研

　経済産業省所管の産業技術総合研究所（産総研）が、半導体製造装置と素材の研究開発拠点を国内に設ける方針であることが３日、分かった。回路線幅の微細化に必要な極端紫外線（ＥＵＶ）露光装置を日本の研究機関として初めて導入する予定。米インテルから技術協力を受け、半導体産業の競争力向上を図る。（2024/09/03-18:25）

The Japanese industry ministry-affiliated National Institute of Advanced Industrial Science and Technology, or AIST, will establish a domestic research and development base for semiconductor production equipment and chip materials, it was learned Tuesday.
   It will be the first Japanese research institute to introduce extreme ultraviolet lithography equipment, crucial for making chips' circuit line widths narrower.
   The institute plans to receive technical cooperation from U.S. technology giant Intel Corp. in its bid to boost the competitiveness of the Japanese chip industry.
   AIST's new base, to be built in three to five years, is expected to feature a system enabling corporations to conduct experiments using extreme ultraviolet lithography equipment for a fee. Also envisioned are measures to develop semiconductor-related personnel through exchanges with foreign research institutes.
   Intel will provide expertise on chip production using extreme ultraviolet lithography technology. It apparently hopes to pursue potential partnerships in manufacturing equipment and semiconductor materials, areas viewed as Japanese manufacturers' fortes.